The second part of the lab procedure focused on particle size and also involved several factors. Label each factor listed below
2 answers:
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Answer:
B = CHCl2 + Cl2 --> CHCl3 + Cl
Explanation:
Free radical halogenation is a chlorination reaction on Alkane hydrocarbons. This involves the splitting of molecules into radicals/ unstable molecules in the presence of sunlight/ U.V light which ensures bonding of the molecules.
Free radical chlorination is divided into 3 steps which are:
The initiation step
The propagation step
The termination step
So in reference to the question, propagation step involves two steps.
The first step is where the molecule in this case the methylene chloride(CH2Cl2) loses a hydrogen atom and then bond with a chlorine atom radical to give a nethylwnw chloride radical and HCl.
The second step involves the reaction of this methylene chloride got in the first step with chlorine molecule to form trichloride methane and a chlorine radical.
You would find in the attachment the 2 step mechanism.
Answer:
- 0.0249% Sb/cm
Explanation:
Given that:
One surface contains 1 Sb atom per 10⁸ Si atoms and the other surface contains 500 Sb atoms per 10⁸ Si atoms.
The concentration gradient in atomic percent (%) Sb per cm can be calculated as follows:
The difference in concentration =
The distance = 0.2-mm = 0.02 cm
Now, the concentration of silicon at one surface containing 1 Sb atom per 10⁸ silicon atoms and at the outer surface that has 500 Sb atom per 10⁸ silicon atoms can be calculated as follows:
= - 0.0249% Sb/cm
b) The concentration of Sb in atom/cm³ for the surface of 1 Sb atoms can be calculated by using the formula:
Lattice parameter = 5.4307 Å; To cm ; we have
=
=
The concentration of Sb in atom/cm³ for the surface of 500 Sb can be calculated as follows:
=
=
Finally, to calculate the concentration gradient